Microwave plasma chemical vapor deposition

Microwave plasma chemical vapor deposition technology (PECVD, MPCVD) increases the reaction rate of precursors and reduces the reaction temperature through plasma. It is suitable for industrial production and treatment, laboratory research and development

Advantages of microwave plasma:

1. It has a high degree of ionization and decomposition

2. The ratio of electron temperature and ion temperature to neutral gas temperature is very high, and the carrier gas maintains an appropriate temperature. This characteristic can make the temperature of the substrate not too high.

3. Plasma can be maintained at high pressure.

4. There is no substance other than working gas in the plasma container, which is clean,

5. High safety factor. High voltage source and plasma generator are isolated from each other, which cannot be achieved by DC plasma.

Microwave technical parameters

Microwave frequency: 2.45GHz

Microwave power: 1-3kw

Control mode: PLC control

Professional manufacturers research technical support, special process requirements support customization.